CST Global MOCVD, epitaxial, thin-film deposition machine.

07 February 2017

CST Global, the UK-based, independent, III-V opto-electronic semiconductor company, has commissioned its first Metalorganic Chemical Vapor Deposition (MOCVD) system. The machine deposits high quality, epitaxial, thin-film layers of materials on 3” and 4”, III-V wafers.

Euan Livingston, VP sales and marketing at CST Global, stated, “The MOCVD machine brings greater flexibility and fully integrated wafer processing in-house, expanding CST Global’s manufacturing and foundry portfolios.

“The MOCVD system dramatically increases our production capability for distributed feedback (DFB) lasers for residential fibre-network applications. It helps CST Global meet ever-increasing, world-wide data transmission demands in the rapidly expanding, passive optical networks (PON) markets in China and India, Metro Access, Regional Access and Long Haul Core networks.

“We are pleased that the MOCVD system is working accurately and consistently, in this notoriously challenging manufacturing process.”